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  • TZTEK provides high precision and repeatability systems for mask metrology which are required during mask manufacturing. Masks could be GOG and PSM or others.


    For the requirement of mask IQC in Fab, TZTEK provides long working distance objectives for protecting mask with pellicle. For CD measurement on the mask, system provides visible and UV illumination in both reflected and transmitted mode. The UV illumination can be used to measure the structure width down to 300 nm, repeatability(3sigma) is mostly in several nanometer range.

    main features

    Critical dimension measurement, defect inspection, review for mask

    Available for mask size up to 14 inch and customized mask shape 

    Visible and UV illumination available in transmitted and reflected modes

    SECS/GEM

    Low maintenance cost, stable and reliable

    Spector
    main features

    Mask critical dimension measurement

    Available for mask size up to 6 inch

    Visible and UV illumination available in transmitted and reflected modes 

    SECS/GEM 

    Low maintenance cost, stable and reliable

    MT270UV
    main features

    Mask film thickness and critical dimension measurement

    Visible, UV and infrared illumination available

    SECS/GEM

    Low maintenance cost, stable and reliable

    MT2010VIS/UV
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